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Titanium (Ti) Sputtering Targets High Pure Titanium Disk

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Titanium (Ti) Sputtering Targets High Pure Titanium Disk enlarge
Titanium (Ti) Sputtering Targets High Pure Titanium Disk enlarge
Titanium (Ti) Sputtering Targets High Pure Titanium Disk enlarge
Titanium (Ti) Sputtering Targets High Pure Titanium Disk enlarge
Price from: 74.62 $
Prices are approximate and are indebted to the time of inclusion in the product catalog.

Description:

Titanium (Ti) Sputtering Targets High Pure Titanium Disk
Introducing our Titanium (Ti) Sputtering Targets, the perfect solution for various thin film deposition applications. Crafted with high purity titanium, these sputtering targets guarantee exceptional performance and durability. Whether you are in the semiconductor, solar energy, or display industry, our titanium sputtering targets will meet your requirements with precision.

Our Titanium (Ti) Sputtering Targets are manufactured using a state-of-the-art process, ensuring the highest level of purity and uniformity. With a purity level of over 99.99%, these targets offer superior consistency and reliability in your sputtering process. The high purity titanium disk provides excellent adhesion, resulting in thin films with outstanding quality and uniformity.

Designed to fit a wide range of sputtering systems, our titanium sputtering targets are available in various sizes and thicknesses, allowing you to choose the perfect match for your specific application. The exceptional thermal conductivity of titanium ensures efficient heat dissipation during the sputtering process, enhancing the target's lifespan and reducing downtime. With our Titanium (Ti) Sputtering Targets, you can achieve precise and controlled deposition for your thin film applications, ensuring excellent performance and reproducibility.

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